ALEXANDRIA, Va., June 12 -- United States Patent no. 12,297,539, issued on May 13, was assigned to Tokyo Electron Ltd. (Tokyo).
"Film forming system and film forming method" was invented by Syuji Nozawa (Nirasaki, Japan) and Tatsuya Yamaguchi (Nirasaki, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A film forming system includes: a film forming apparatus which includes a processing container, a stage provided in the processing container, a structure provided in the processing container and having recesses, and a window provided on a wall surface of the processing container; a measurement device which includes a light emitter, a light receiver, and a measurer configured to measure a light reflectance f...