US Patent Issued to Tokyo Electron on March 4 for "Substrate processing monitoring apparatus based on imaging video data, substrate processing apparatus, substrate processing monitoring method, and storage medium" (Japanese Inventors)

ALEXANDRIA, Va., March 5 -- United States Patent no. 12,244,972, issued on March 4, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate processing monitoring apparatus based on imaging video data, substrate processing apparatus, substrate processing monitoring method, and storage medium" was invented by Yuichiro Kunugimoto (Kumamoto, Japan), Keishi Hamada (Kumamoto, Japan), Takafumi Hayama (Kumamoto, Japan), Motoi Okada (Hokkaido, Japan) and Shoki Hamaguchi (Hokkaido, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A monitoring apparatus for a substrate processing apparatus includes: an imaging unit that captures an image of a nozzle of the substrate processing apparatus and a surface of a substrate...