ALEXANDRIA, Va., March 26 -- United States Patent no. 12,259,419, issued on March 25, was assigned to Tokyo Electron Ltd. (Tokyo).
"Test device and probe polishing method" was invented by Masahito Kobayashi (Yamanashi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A test device for testing a substrate is provided. The device comprises: a mounting table for test on which the substrate under test is mounted; a transportation mechanism to transport the substrate under test; a mounting table for polishing on which a polishing substrate is mounted; a first forward or backward movement mechanism to move the mounting table for test with respect to a probe; and a second forward or backward movement mechanism ...