US Patent Issued to Tokyo Electron on March 25 for "Tank, substrate processing apparatus, and method of using the tank" (Japanese Inventors)

ALEXANDRIA, Va., March 26 -- United States Patent no. 12,261,064, issued on March 25, was assigned to Tokyo Electron Ltd. (Tokyo).

"Tank, substrate processing apparatus, and method of using the tank" was invented by Tomohiko Muta (Koshi, Japan), Daiki Shibata (Koshi, Japan), Akiko Kai (Koshi, Japan) and Makoto Ogata (Koshi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A tank includes a container part having an upper wall, a sidewall and a bottom wall to store a processing liquid therein, a liquid discharge passage installed at a position higher than a liquid surface of the processing liquid stored in the container part to discharge the processing liquid into the container part, and a gas discharge pa...