US Patent Issued to Tokyo Electron on March 25 for "Substrate processing apparatus and stage cleaning method" (Japanese Inventor)

ALEXANDRIA, Va., March 26 -- United States Patent no. 12,261,060, issued on March 25, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate processing apparatus and stage cleaning method" was invented by Tsutomu Hiroki (Nirasaki, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes a stage on which a substrate to be processed is placed, a liquid supply unit for supplying liquid for controlling a temperature of the substrate to the stage, a flow path formed in the stage and through which the supplied liquid flows, a liquid receiving unit for receiving the liquid discharged from the flow path, a heater for heating the stage to a temperature higher than a usable tempe...