US Patent Issued to Tokyo Electron on March 25 for "Resonant antenna for physical vapor deposition applications" (Japanese Inventors)

ALEXANDRIA, Va., March 26 -- United States Patent no. 12,261,017, issued on March 25, was assigned to Tokyo Electron Ltd. (Tokyo).

"Resonant antenna for physical vapor deposition applications" was invented by Barton Lane (Tokyo) and Masaki Takagi (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "Systems and methods provide a solution for efficiently generating high density plasma for a physical vapor deposition (PVD). The present solution includes a vacuum chamber for a PVD process. The system can include a target located within the vacuum chamber for sputtering a material onto a wafer. The system can include a resonant structure formed by an antenna and a plurality of capacitors. The resonant structure ...