US Patent Issued to Tokyo Electron on March 25 for "Plasma processing apparatus and plasma processing method" (Japanese Inventors)

ALEXANDRIA, Va., March 26 -- United States Patent no. 12,261,027, issued on March 25, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing apparatus and plasma processing method" was invented by Natsumi Torii (Miyagi, Japan), Koichi Nagami (Miyagi, Japan), Chishio Koshimizu (Miyagi, Japan) and Jun Abe (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided a plasma processing apparatus for performing plasma processing or a substrate, comprising: a chamber; a substrate support disposed in the chamber and including a base, an electrostatic chuck on the base, and an edge ring disposed to surround a substrate mounted on the electrostatic chuck; a Radio Frequency (RF) power supp...