ALEXANDRIA, Va., March 26 -- United States Patent no. 12,261,024, issued on March 25, was assigned to Tokyo Electron Ltd. (Tokyo).
"Plasma processing apparatus and cleaning method" was invented by Wataru Shimizu (Miyagi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An electrode is disposed within a chamber. Multiple gas discharge ports are disposed around the electrode to discharge a gas toward the electrode. A gas supply is configured to supply a processing gas to the multiple gas discharge ports. A radio frequency power supply is configured to supply a radio frequency power to the electrode to excite the processing gas into plasma. A controller is configured to control the radio frequency power sup...