ALEXANDRIA, Va., March 19 -- United States Patent no. 12,255,092, issued on March 18, was assigned to Tokyo Electron Ltd. (Tokyo).
"Substrate processing apparatus" was invented by Junnosuke Taguchi (Iwate, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes: a rotary table provided inside a processing container; a stage provided on an upper surface of the rotary table in order to mount a substrate thereon, and configured to revolve by a rotation of the rotary table; a heater configured to heat the substrate mounted on the stage; and a rotation shaft provided at a location that rotates together with the rotary table to freely rotate while supporting the stage, and in...