US Patent Issued to Tokyo Electron on March 18 for "Cleaning method and substrate processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., March 19 -- United States Patent no. 12,252,786, issued on March 18, was assigned to Tokyo Electron Ltd. (Tokyo).

"Cleaning method and substrate processing apparatus" was invented by Yoshihiro Takezawa (Nirasaki, Japan), Daisuke Suzuki (Nirasaki, Japan), Hiroyuki Hayashi (Nirasaki, Japan), Tatsuya Miyahara (Nirasaki, Japan), Keisuke Fujita (Nirasaki, Japan), Masami Oikawa (Oshu, Japan) and Sena Fujita (Nirasaki, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A cleaning method according to an aspect of the present disclosure includes: supplying a halogen-containing gas that does not contain fluorine to an interior of a processing container that is capable of being exhausted via an exhau...