ALEXANDRIA, Va., March 19 -- United States Patent no. 12,256,471, issued on March 18, was assigned to Tokyo Electron Ltd. (Tokyo).

"Apparatus for heating substrate and method thereof" was invented by Takahisa Mase (Nirasaki, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus for heating a substrate includes: a stage including at least one resistance heater that heats the substrate placed thereon; a temperature detector for detecting a heating temperature of the substrate; a temperature calculator for calculating the heating temperature based on a resistance value of the at least one resistance heater; a power controller for performing a power control with respect to a first power to be supplie...