US Patent Issued to Tokyo Electron on June 3 for "Substrate support member, substrate treatment apparatus, and substrate transfer apparatus" (Japanese Inventor)

ALEXANDRIA, Va., June 4 -- United States Patent no. 12,321,098, issued on June 3, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate support member, substrate treatment apparatus, and substrate transfer apparatus" was invented by Hitoshi Hashima (Koshi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A solution treatment apparatus performs a solution treatment on a substrate using treatment solution. The solution treatment apparatus includes a substrate holder that rotates and holds the substrate; a nozzle that supplies the treatment solution to the substrate on the substrate holder, and raising and lowering pins that raise and lower the substrate above a stage for the substrate. One or more of the...