US Patent Issued to Tokyo Electron on June 3 for "Substrate processing system, substrate processing method, and recording medium" (Japanese Inventors)

ALEXANDRIA, Va., June 4 -- United States Patent no. 12,322,631, issued on June 3, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate processing system, substrate processing method, and recording medium" was invented by Takafumi Tsuchiya (Koshi, Japan), Hiromi Hara (Koshi, Japan), Wataru Tsukinoki (Koshi, Japan) and Shuhei Goto (Koshi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing system includes a carry-in/out unit in which a cassette accommodating therein multiple substrates is carried in and out; a batch processing unit configured to process a lot including the multiple substrates at once; a single-wafer processing unit configured to process the substrates one by one; a f...