US Patent Issued to Tokyo Electron on June 3 for "Substrate laser processing method and substrate laser processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., June 4 -- United States Patent no. 12,322,656, issued on June 3, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate laser processing method and substrate laser processing apparatus" was invented by Yohei Yamashita (Kumamoto, Japan), Hayato Tanoue (Kumamoto, Japan) and Yasutaka Mizomoto (Kumamoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing method of transcribing, in a combined substrate in which a first substrate and a second substrate are bonded to each other, a device layer formed on a surface of the second substrate to the first substrate is provided. A laser beam is radiated in a pulse shape from a rear surface side of the second substrate to a laser ...