ALEXANDRIA, Va., June 25 -- United States Patent no. 12,340,977, issued on June 24, was assigned to Tokyo Electron Ltd. (Tokyo).
"Plasma source and plasma processing apparatus" was invented by Kenta Kato (Yamanashi, Japan) and Taro Ikeda (Yamanashi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma source comprising: a plasma generator including a first wall having an opening and a second wall facing the first wall, and forming a plasma generating space; a dielectric window disposed on the first wall to block the opening and configured to transmit electromagnetic waves to the plasma generating space; and a protruding portion disposed on the second wall, protruding from the second wall to be close...