US Patent Issued to Tokyo Electron on June 24 for "Plasma processing method and plasma processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., June 25 -- United States Patent no. 12,338,532, issued on June 24, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing method and plasma processing apparatus" was invented by Taro Ikeda (Yamanashi, Japan), Eiki Kamata (Yamanashi, Japan) and Yoshiyuki Kondo (Yamanashi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of this application discloses a plasma processing method performed in a plasma processing apparatus having a plurality of plasma sources, the plasma processing method comprising: controlling each of the plasma sources so that at least one plasma source of the plurality of plasma sources is in a first state referring an OFF-state or a power state of a f...