ALEXANDRIA, Va., June 25 -- United States Patent no. 12,339,593, issued on June 24, was assigned to Tokyo Electron Ltd. (Tokyo).
"Developing method and substrate treatment system" was invented by Yuya Kamei (Koshi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A developing method of performing a developing treatment on a substrate includes supplying a developing solution containing an organic solvent to the substrate having a metal-containing coating film exposed into a predetermined pattern; and supplying a cleaning solution containing an organic solvent to the substrate supplied with the developing solution. The cleaning solution is lower in solubility of the metal-containing coating film than the d...