US Patent Issued to Tokyo Electron on June 10 for "Substrate transfer device and substrate processing system" (Japanese Inventors)

ALEXANDRIA, Va., June 18 -- United States Patent no. 12,327,744, issued on June 10, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate transfer device and substrate processing system" was invented by Tatsuo Hatano (Nirasaki, Japan), Tetsuya Miyashita (Nirasaki, Japan), Naoki Watanabe (Nirasaki, Japan) and Naoyuki Suzuki (Fuchu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate transfer device, includes: a first planar motor installed in a first chamber and having an array of coils; a second planar motor installed in a second chamber connected to the first chamber and having an array of coils; a pair of transfer units configured to move on at least one of the first planar motor and the sec...