ALEXANDRIA, Va., June 18 -- United States Patent no. 12,325,919, issued on June 10, was assigned to Tokyo Electron Ltd. (Tokyo).
"Apparatus for processing substrate" was invented by Masahiro Tabata (Miyagi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus for processing a substrate is provided. The apparatus includes a processing apparatus and a controller. The processing apparatus includes a chamber. The controller includes a memory and a processor coupled to the memory. The memory stores computer-executable instructions for controlling the processor to control a process of the processing apparatus. The process includes first forming a first film in a first region of the substrate in the ch...