ALEXANDRIA, Va., July 9 -- United States Patent no. 12,354,890, issued on July 8, was assigned to Tokyo Electron Ltd. (Tokyo).
"Stage and plasma processing apparatus" was invented by Shota Ezaki (Miyagi, Japan), Katsuyuki Koizumi (Miyagi, Japan) and Masanori Takahashi (Miyagi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A stage includes a base having an accommodation space therein, a dielectric layer provided on a first surface of the base and having a placement surface on which a substrate is placed, the dielectric layer including therein a plurality of heaters, and a heater control board disposed in the accommodation space and configured to drive the plurality of heaters. The base has an inlet in ...