ALEXANDRIA, Va., July 9 -- United States Patent no. 12,354,849, issued on July 8, was assigned to Tokyo Electron Ltd. (Tokyo).
"Plasma processing apparatus" was invented by Gyeong min Park (Miyagi, Japan) and Nobutaka Sasaki (Miyagi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus, comprising a plasma processing chamber; a plasma generator to generate a plasma from a processing gas in the plasma processing chamber; and a substrate support disposed in the plasma processing chamber, is provided. The substrate support includes a base; an electrostatic chuck disposed above the base; a first annular member to surround a substrate on the substrate support; a second annular member...