US Patent Issued to Tokyo Electron on July 29 for "Plasma processing system and method of mounting annular member" (Japanese Inventor)

ALEXANDRIA, Va., July 30 -- United States Patent no. 12,374,533, issued on July 29, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing system and method of mounting annular member" was invented by Shin Matsuura (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing system is provided. The system comprises a plasma processing apparatus, a transfer apparatus connected to the plasma processing apparatus, and a controler. The plasma processing apparatus includes a substrate support including a support unit for a substrate as well as an annular member disposed to surround the substrate. The substrate support includes a plurality of insertion holes passing through the suppor...