ALEXANDRIA, Va., July 30 -- United States Patent no. 12,374,531, issued on July 29, was assigned to Tokyo Electron Ltd. (Tokyo).
"Plasma processing apparatus" was invented by Hwajun Jung (Gyeonggi-do, South Korea), Mitsunori Ohata (Miyagi, Japan) and Yuki Hosaka (Miyagi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus comprising a processing chamber, a dielectric, an antenna, and a first to third electromagnet groups is disclosed. In the processing chamber, a mounting table having a mounting surface is included and a plasma process is performed. A surface of the dielectric faces the mounting surface. The antenna, provided on the opposite surface of the dielectric, introduce...