ALEXANDRIA, Va., July 30 -- United States Patent no. 12,371,785, issued on July 29, was assigned to Tokyo Electron Ltd. (Tokyo).
"Method for forming film on substrate surface having convex portion" was invented by Kazumi Kubo (Iwate, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A film forming method includes causing adsorption of a source gas on a substrate surface having a convex portion, and forming a film on the substrate surface using a thermal reaction between the adsorbed source gas and a reactive gas. The substrate is disposed on a surface of a turntable provided inside a vacuum chamber. An adsorption region in which the causing is performed, and a reaction region in which the forming is perfo...