US Patent Issued to Tokyo Electron on July 29 for "Gas management method and substrate processing system" (Japanese Inventors)

ALEXANDRIA, Va., July 30 -- United States Patent no. 12,371,784, issued on July 29, was assigned to Tokyo Electron Ltd. (Tokyo).

"Gas management method and substrate processing system" was invented by Koji Sasaki (Yamanashi, Japan), Yuji Seshimo (Yamanashi, Japan) and Katsuyuki Higashi (Yamanashi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A gas management method includes: heating a raw material container that accommodates a raw material, by a heater, thereby generating a vaporized raw material gas; supplying the vaporized raw material gas together with a carrier gas to a processing container that accommodates a substrate, thereby performing a processing on the substrate; and controlling the heater...