ALEXANDRIA, Va., July 30 -- United States Patent no. 12,372,871, issued on July 29, was assigned to Tokyo Electron Ltd. (Tokyo).
"EUV active films for EUV lithography" was invented by Robert Clark (Fremont, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of processing a substrate that includes forming over the substrate an extreme ultraviolet (EUV)-active photoresist film including a network of metal oxide terminated with alkoxy groups and patterning the EUV-active photoresist film with EUV lithography."
The patent was filed on Nov. 9, 2021, under Application No. 17/522,563.
*For further information, including images, charts and tables, please visit: http://patft.uspto.gov/netacgi/nph-Parser...