ALEXANDRIA, Va., July 23 -- United States Patent no. 12,365,985, issued on July 22, was assigned to Tokyo Electron Ltd. (Tokyo).

"Deposition apparatus with pressure sensor and shower head on same plane and deposition method" was invented by Yuji Obata (Yamanashi, Japan) and Tsuneyuki Okabe (Yamanashi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A deposition apparatus includes: a decompressable process container; a showerhead configured to supply a gas in the process container, the showerhead including a lower member having a plurality of gas holes and an upper member that forms, between the upper member and the lower member, a diffusion space that diffuses the gas; a mounting table arranged to face ...