US Patent Issued to Tokyo Electron on July 22 for "Cleaning method of cup of substrate processing apparatus and substrate processing apparatus" (Japanese Inventor)

ALEXANDRIA, Va., July 23 -- United States Patent no. 12,368,041, issued on July 22, was assigned to Tokyo Electron Ltd. (Tokyo).

"Cleaning method of cup of substrate processing apparatus and substrate processing apparatus" was invented by Motohiro Okamura (Koshi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A cleaning method includes (A) and (B) described below. (A) A first processing liquid is supplied to a central portion of a top surface of a substrate from a first nozzle and, also, a second processing liquid is supplied to a periphery of the top surface of the substrate from a second nozzle in a state that the substrate is horizontally held inside a cup and the substrate is rotated in a first dir...