US Patent Issued to Tokyo Electron on July 15 for "Plasma processing apparatus and plasma processing method" (Japanese Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,362,143, issued on July 15, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing apparatus and plasma processing method" was invented by Satoru Kawakami (Nirasaki, Japan), Tadashi Mitsunari (Nirasaki, Japan), Shinya Iwashita (Nirasaki, Japan) and Yusuke Suzuki (Nirasaki, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "In a plasma processing apparatus, a processing chamber is provided. First electrodes are disposed inside the processing chamber and supplied with radio frequency powers. The second electrode is disposed inside the processing chamber and functions as a counter electrode for the first electrodes. The power supply source suppl...