US Patent Issued to Tokyo Electron on July 15 for "Plasma processing apparatus and plasma processing method" (Japanese Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,362,151, issued on July 15, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing apparatus and plasma processing method" was invented by Taro Ikeda (Nirasaki, Japan), Toshifumi Kitahara (Fuchu, Japan) and Satoru Kawakami (Nirasaki, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus includes a stage provided in a processing container, and an upper electrode. The upper electrode includes a dielectric plate facing the stage, and a conductor formed on a surface of the dielectric plate opposite to a surface of the dielectric plate facing the stage. The dielectric plate includes a central portion, an outer peripheral...