US Patent Issued to Tokyo Electron on July 15 for "Plasma processing apparatus and plasma processing method" (Japanese Inventor)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,362,145, issued on July 15, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing apparatus and plasma processing method" was invented by Yuji Sasaki (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus includes an electrostatic chuck including an electrode, a first switch, a second switch, and a control unit. The control unit controls the first switch and the second switch to be in a closed state, causes a power supply to output a first voltage, and determines that the first switch and the second switch are in the closed state when the first voltage is detected by a detector. Further, after it is determi...