ALEXANDRIA, Va., July 16 -- United States Patent no. 12,362,208, issued on July 15, was assigned to Tokyo Electron Ltd. (Tokyo).
"Inspection method and etching system" was invented by Takeshi Akimoto (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided a method of inspecting a substrate in an etching system including an imaging device, the method comprising: (A) imaging a substrate after plasma etching with the imaging device to acquire image data; and (B) calculating, based on the image data of the substrate after plasma etching, at least one selected from a group consisting of a dimension of a pattern on the substrate after plasma etching, information on a defect on the substrate after p...