ALEXANDRIA, Va., July 3 -- United States Patent no. 12,347,660, issued on July 1, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate processing apparatus, substrate processing system, and maintenance method" was invented by Atsushi Sawachi (Miyagi, Japan), Jun Hirose (Miyagi, Japan), Takuya Nishijima (Miyagi, Japan), Ichiro Sone (Miyagi, Japan) and Suguru Sato (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus is provided. The substrate processing apparatus comprise: a first chamber including a sidewall providing an opening, the first chamber further including a movable part movable upward and downward within the first chamber; a substrate support disposed wit...