ALEXANDRIA, Va., July 3 -- United States Patent no. 12,347,649, issued on July 1, was assigned to Tokyo Electron Ltd. (Tokyo).
"Plasma processing apparatus and lid member" was invented by Hiroshi Kondo (Fuchu, Japan) and Haruhiko Furuya (Nirasaki, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus includes: a processing container in which a stage is accommodated and including an opening formed above the stage; a lid member for sealing the opening and including: at least one through-hole formed in a region facing the stage and in which a radiation part for radiating microwaves is arranged; a protruded portion formed on a first surface facing an interior of the processing contai...