US Patent Issued to Tokyo Electron on Jan. 28 for "Method of controlling substrate transfer system and the substrate transfer system" (Japanese Inventors)

ALEXANDRIA, Va., Jan. 29 -- United States Patent no. 12,211,719, issued on Jan. 28, was assigned to Tokyo Electron Ltd. (Tokyo).

"Method of controlling substrate transfer system and the substrate transfer system" was invented by Wataru Matsumoto (Nirasaki, Japan) and Takehiro Shindo (Nirasaki, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of controlling a substrate transfer system including a transfer mechanism having a holder, and a measurement part that detects an outer periphery of the substrate to measure a center position of the substrate, thereby transferring the substrate to a target position, includes: correcting the target position based on an amount of positional deviation between a...