US Patent Issued to Tokyo Electron on Jan. 28 for "Measurement system, measurement method, and plasma processing device" (Japanese Inventors)

ALEXANDRIA, Va., Jan. 29 -- United States Patent no. 12,211,676, issued on Jan. 28, was assigned to Tokyo Electron Ltd. (Tokyo).

"Measurement system, measurement method, and plasma processing device" was invented by Ayuta Suzuki (Yamanashi, Japan), Hidefumi Matsui (Yamanashi, Japan) and Atsushi Kubo (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A measurement system including an imaging device and a plasma processing device having a plasma generator configured to generate plasma from a gas supplied into a processing chamber and a controller. The imaging device is configured to generate optical information of the plasma from image data of imaged plasma in the processing chamber, and the controller is c...