ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,537,170, issued on Jan. 27, was assigned to Tokyo Electron Ltd. (Tokyo).
"Substrate processing apparatus" was invented by Jun Yamawaku (Nirasaki, Japan) and Chishio Koshimizu (Miyagi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided a focus ring that is capable of preventing deposits from adhering to a member having a lower temperature in a gap between two members having different temperatures. A focus ring 25 is disposed to surround a peripheral portion of a wafer W in a chamber 11 of a substrate processing apparatus 10. The focus ring 25 includes an inner focus ring 25a and an outer focus ring 25b. Here, the inner focus ring 25a ...