US Patent Issued to Tokyo Electron on Jan. 27 for "Substrate cleaning apparatus and substrate cleaning method" (Japanese Inventors)

ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,533,715, issued on Jan. 27, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate cleaning apparatus and substrate cleaning method" was invented by Yoshiki Okamoto (Koshi, Japan), Akihiro Kubo (Koshi, Japan) and Yasushi Takiguchi (Koshi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate cleaning apparatus includes a holder configured to hold a substrate; a circular ring-shaped body; grooves formed in a radial shape at an upper portion of the circular ring-shaped body, each groove having a bottom located on the circular ring-shaped body; a sliding surface which is a top surface of the circular ring-shaped body between the respective groo...