US Patent Issued to Tokyo Electron on Jan. 27 for "Raw material feeding device, substrate processing system, and residual estimation method" (Japanese Inventors)

ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,538,741, issued on Jan. 27, was assigned to Tokyo Electron Ltd. (Tokyo).

"Raw material feeding device, substrate processing system, and residual estimation method" was invented by Hiroyuki Karasawa (Yamanashi, Japan) and Tomohiro Saito (Yamanashi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A raw material feeding device includes: a raw material container that accommodates a solid or liquid raw material; an upstream path connected to the raw material container; a downstream path connected to the raw material container; a bypass path that connects the upstream path and the downstream path to each other without passing through the raw material con...