ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,537,169, issued on Jan. 27, was assigned to Tokyo Electron Ltd. (Tokyo).
"Plasma source and plasma processing apparatus" was invented by Ryoji Yamazaki (Yamanashi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma source comprises a metal member having an inlet and forming a wall that delimits an upstream flow of a processing gas supplied from the inlet, a ceramic member having an outlet and forming a wall that delimits a downstream flow of the processing gas discharged from the outlet, and a power supply device configured to supply a power for plasma generation into a chamber. The chamber includes the metal member and the ceramic member, an...