US Patent Issued to Tokyo Electron on Jan. 13 for "Substrate processing system and substrate processing method" (Japanese Inventors)

ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,525,465, issued on Jan. 13, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate processing system and substrate processing method" was invented by Kouzou Kanagawa (Koshi, Japan), Kotaro Tsurusaki (Koshi, Japan), Keiji Onzuka (Koshi, Japan) and Yoshihiro Kai (Koshi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing system includes: a batch-type processing part that collectively processes a lot including substrates arranged at a first pitch; a single-substrate-type processing part that processes the substrates of the lot one by one; and an interface part that delivers the substrates between the batch-type processing part and ...