US Patent Issued to Tokyo Electron on Jan. 13 for "Substrate bombardment with ions having targeted mass using pulsed bias phase control" (New York Inventors)

ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,525,437, issued on Jan. 13, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate bombardment with ions having targeted mass using pulsed bias phase control" was invented by Sergey Voronin (Albany, N.Y.), Qi Wang (Albany, N.Y.) and Hamed Hajibabaeinajafabadi (Albany, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of plasma processing includes generating plasma by coupling a source power pulse to a plasma processing chamber containing a substrate holder configured to support a substrate. The plasma includes first ions having a first mass and second ions having a second mass greater than the first mass. The ion density ratio of the second ...