ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,525,466, issued on Jan. 13, was assigned to Tokyo Electron Ltd. (Tokyo).
"Processing apparatus and processing method" was invented by Atsushi Sawachi (Miyagi, Japan) and Kosuke Ogasawara (Miyagi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A processing apparatus which processes a substrate is disclosed. The processing apparatus comprises: a plurality of processing chambers which process the substrate in an atmosphere of a desired processing gases; a plurality of tank units provided for each of the plurality of processing chambers, the plurality of tank units including a plurality of tanks configured for temporarily storing the processing gases;...