ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,525,438, issued on Jan. 13, was assigned to Tokyo Electron Ltd. (Tokyo).
"Plasma processing apparatus and storage medium" was invented by Yusuke Aoki (Miyagi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus includes an electrostatic chuck that adsorbs a substrate, a relay circuit that turns ON and OFF the supply of voltage to the electrostatic electrode, a plasma generator, and a controller. The controller (a) controls the DC power supply to supply the voltage to the electrostatic electrode, thereby adsorbing the substrate to the electrostatic chuck, (b) controls the relay circuit to turn OFF the supply of the voltage ...