US Patent Issued to Tokyo Electron on Jan. 13 for "Method of cleaning electrostatic chuck and method of manufacturing semiconductor device while exposing electrostatic chuck to plasma and introducing electron current" (Japanese Inventors)

ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,521,773, issued on Jan. 13, was assigned to Tokyo Electron Ltd. (Tokyo).

"Method of cleaning electrostatic chuck and method of manufacturing semiconductor device while exposing electrostatic chuck to plasma and introducing electron current" was invented by Koichi Nakajima (Nirasaki, Japan), Satoshi Chida (Oshu, Japan) and Satoshi Chino (Nirasaki, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A cleaning method according to one aspect of the present disclosure which cleans an electrostatic chuck includes exposing the electrostatic chuck to plasma and maintaining a relationship between a potential of the electrostatic chuck and a potential of the pl...