US Patent Issued to Tokyo Electron on Jan. 13 for "Measurement apparatus, measurement system, substrate processing apparatus, and measurement method" (Japanese Inventor)

ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,523,546, issued on Jan. 13, was assigned to Tokyo Electron Ltd. (Tokyo).

"Measurement apparatus, measurement system, substrate processing apparatus, and measurement method" was invented by Kosuke Urakawa (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A measurement apparatus includes: an input part into which a signal according to a state of a measurement target is input; a measurement part configured to measure the state of the measurement target from the signal input to the input part, and generate, when the measurement of the state of the measurement target is completed, a switching instruction signal instructing switching a multiplexer...