ALEXANDRIA, Va., Feb. 5 -- United States Patent no. 12,217,998, issued on Feb. 4, was assigned to Tokyo Electron Ltd. (Tokyo).
"Substrate processing apparatus" was invented by Junnosuke Taguchi (Iwate, Japan) and Nobuhiro Takahashi (Iwate, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes a vacuum chamber, a rotary table that is rotatably provided inside the vacuum chamber, a stage that is rotatable with respect to the rotary table, the stage having a center of rotation at a position spaced apart from a center of rotation of the rotary table, and the stage having a flange provided at a lower surface of the stage, a first holder and a second holder, the flange bein...