US Patent Issued to Tokyo Electron on Feb. 4 for "Plasma processing methods using multiphase multifrequency bias pulses" (Texas Inventors)

ALEXANDRIA, Va., Feb. 5 -- United States Patent no. 12,217,935, issued on Feb. 4, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing methods using multiphase multifrequency bias pulses" was invented by Ya-Ming Chen (Austin, Texas), Shyam Sridhar (Austin, Texas), Peter Lowell George Ventzek (Austin, Texas) and Alok Ranjan (Austin, Texas).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing method includes generating a plasma within a processing chamber using source power to ignite a glow phase of the plasma, generating low-energy ions at a substrate supported by a substrate holder in the processing chamber from the plasma using lower-frequency radio frequency bias power applied durin...