US Patent Issued to Tokyo Electron on Feb. 3 for "Substrate transfer method, substrate processing apparatus, and recording medium" (Japanese Inventors)

ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,543,530, issued on Feb. 3, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate transfer method, substrate processing apparatus, and recording medium" was invented by Shingo Katsuki (Koshi, Japan), Kenichirou Matsuyama (Koshi, Japan), Sho Kano (Koshi, Japan) and Saori Kosaki (Koshi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate transfer method performed in a substrate processing apparatus including a transfer mechanism group configured to transfer a substrate into a carrier via a module group and an exposure apparatus is provided. The transfer mechanism group includes a first transfer mechanism configured to transfer the substrate i...