ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,542,261, issued on Feb. 3, was assigned to Tokyo Electron Ltd. (Tokyo).
"Substrate processing apparatus" was invented by Eiichi Sugawara (Kurokawa-gun, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a substrate processing apparatus, including: transportation chamber maintained in an atmospheric environment where a substrate is transported; a vacuum processing chamber connected with the transportation chamber through a load lock chamber; a substrate placing table installed in the vacuum processing chamber and having a body part and a surface part that is attachable to/detachable from the body part; a storage unit installed in the load lo...